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Extreme ultraviolet lithography
Lithography using 13.5 nm UV light
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📌 Topics
- Artificial Intelligence (1)
- Semiconductor Industry (1)
- Corporate Restructuring (1)
- Technology Manufacturing (1)
🏷️ Keywords
ASML (1) · AI demand (1) · semiconductor equipment (1) · photolithography (1) · job cuts (1) · 2025 profit (1) · EUV lithography (1) · Dutch technology sector (1)
📖 Key Information
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
As of 2025, ASML Holding is the only company that produces and sells EUV systems for chip production, targeting 5 nanometer (nm) and 3 nm process nodes, though Reuters reported in December 2025 that China had developed its own prototype EUV system.
📰 Related News (1)
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🇺🇸 ASML made record $11.5 billion profit in 2025 thanks to AI-driven demand, plans to cut 1,700 jobsASML reports a record net profit of 9.6 billion euros in 2025, driven by AI demand...
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