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Extreme ultraviolet lithography
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Extreme ultraviolet lithography

Lithography using 13.5 nm UV light

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📌 Topics

  • Technology Competition (1)
  • Trade Policy (1)
  • National Security (1)
  • Artificial Intelligence (1)
  • Semiconductor Industry (1)
  • Corporate Restructuring (1)
  • Technology Manufacturing (1)

🏷️ Keywords

EUV lithography (2) · MATCH Act (1) · semiconductor export controls (1) · U.S.-China tech war (1) · chip manufacturing (1) · technology decoupling (1) · Made in China 2025 (1) · global supply chains (1) · ASML (1) · AI demand (1) · semiconductor equipment (1) · photolithography (1) · job cuts (1) · 2025 profit (1) · Dutch technology sector (1)

📖 Key Information

Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates. As of 2025, ASML Holding is the only company that produces and sells EUV systems for chip production, targeting 5 nanometer (nm) and 3 nm process nodes, though Reuters reported in December 2025 that China had developed its own prototype EUV system.

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ASML(1)Extreme ultraviolet lithography

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    ASML · 1 shared articles

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